The Center is equipped with advanced instrumentation for the fabrication of microrobotic devices.

Complete lithographic facilities, comprising a wet bench, electroplating baths and a mask aligner, are hosted in an ISO 6 clean room. The thin-film deposition of metals, oxides and polymers is performed by a thermal evaporator, a RF/DC magnetron sputtering and spin coaters. Nanopatterning enabling facilities, such as a Focused Ion Beam (FIB) and a Dual Beam FIB/SEM, are located in an ISO 7 clean room. Equipment for 3D patterning includes a Direct Laser Writer (DLW) and a 3D printer. A Computer Numerically Controlled (CNC) machine, sink and wire Electro-Deposition Machines (EDM) and a cutting/engraving laser are available for micromachining of metal and polymer microcomponents. Soft patterning technologies also include an inkjet printer for polymers, biomolecules and nanoparticle solutions.

Microscopy instrumentation for characterizing and validating devices includes a confocal microscope, a Scanning Electron Microscope (SEM) equipped with a silicon drift detector for X-ray microanalysis, a Scanning Probe Microscope (SPM), an inverted epifluorescence microscope and digital microscopes with endoscopic imaging capability. Surface analysis can also be performed by stylus and optical profilometry. Dynamometers for artificial and biological specimens and an analytical probe system are also available for electromechanical measurements.